Methods and systems including pulsed bi-beam charge neutralization
A surface imaging device and surface analysis device based on secondary electron or secondary ion detection, the method comprising: a spatial scan and a DC or pulsed main excitation source generating secondary electrons or secondary ions, the secondary electrons or secondary ions being detected and...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | A surface imaging device and surface analysis device based on secondary electron or secondary ion detection, the method comprising: a spatial scan and a DC or pulsed main excitation source generating secondary electrons or secondary ions, the secondary electrons or secondary ions being detected and providing a modulation signal for imaging a sample; and a bipolar flood beam for influencing the neutralization of surface charges and surface potential variations.
基于二次电子或二次离子检测的表面成像装置、表面分析装置、方法包括:空间扫描和DC或脉冲式主激发源,其产生二次电子或二次离子,所述二次电子或二次离子被检测并提供用于对样品成像的调制信号;以及双极性泛射束,用于影响表面电荷的中和以及表面电势变化。 |
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