Photoresist stripping solution and application process thereof

The invention relates to a photoresist stripping and removing solution and an application process thereof, the photoresist stripping and removing solution can be used for stripping positive photoresist and negative photoresist, the photoresist stripping and removing solution comprises a main solvent...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	XUE YUZHU, WANG KAI, YAN XIANG, ZHU XUANYE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!