Photoresist stripping solution and application process thereof

The invention relates to a photoresist stripping and removing solution and an application process thereof, the photoresist stripping and removing solution can be used for stripping positive photoresist and negative photoresist, the photoresist stripping and removing solution comprises a main solvent and an auxiliary solvent, the main solvent is 1, 3-dioxolane, and the auxiliary solvent is a polyol derivative. The photoresist stripping solution disclosed by the invention is high in photoresist stripping speed, good in photoresist stripping effect, environment-friendly and applicable to special substrate materials. 本发明涉及一种光刻胶剥离去胶液及其应用工艺，光刻胶剥离去胶液可用于正性光刻胶和负极光刻胶的剥离，光刻胶剥离去胶液包括主溶剂和辅助溶剂，主溶剂为1,3-二氧五环，所述辅助溶剂为多元醇衍生物。本发明的光刻胶剥离去胶液具有去胶速率快、去胶效果好、环境友好，可适用于特殊衬底材料。