CERAMIC COMPONENT WITH CHANNELS
Methods for forming components of a plasma processing chamber are provided. An internal mold is provided. An outer mold surrounding the inner mold is provided. The outer mold is filled with a ceramic powder, wherein the ceramic powder surrounds the inner mold. The ceramic powder is sintered to form...
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| creator | HAZARIKA PANKAJ WETZEL DAVID JOSEPH LIU LEI KERNS JOHN MICHAEL DETERT DOUGLAS XU LIN PAPE ERIC A |
| description | Methods for forming components of a plasma processing chamber are provided. An internal mold is provided. An outer mold surrounding the inner mold is provided. The outer mold is filled with a ceramic powder, wherein the ceramic powder surrounds the inner mold. The ceramic powder is sintered to form a solid component. The solid component is removed from the outer mold.
提供用于形成等离子体处理室的构件的方法。提供内部模具。提供将该内部模具围绕的外部模具。用陶瓷粉末填充该外部模具，其中该陶瓷粉末围绕该内部模具。烧结该陶瓷粉末以形成实心部件。将该实心部件从该外部模具移除。 |
| format | Patent |
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提供用于形成等离子体处理室的构件的方法。提供内部模具。提供将该内部模具围绕的外部模具。用陶瓷粉末填充该外部模具，其中该陶瓷粉末围绕该内部模具。烧结该陶瓷粉末以形成实心部件。将该实心部件从该外部模具移除。</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</subject><subject>ELECTRICITY</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJB3dg1y9PV0VnD29w3w93P1C1EI9wzxUHD2cPTzc_UJ5mFgTUvMKU7lhdLcDIpuriHOHrqpBfnxqcUFicmpeakl8c5-hoZmJqbmloYmjsbEqAEA0M0hoQ</recordid><startdate>20230718</startdate><enddate>20230718</enddate><creator>HAZARIKA PANKAJ</creator><creator>WETZEL DAVID JOSEPH</creator><creator>LIU LEI</creator><creator>KERNS JOHN MICHAEL</creator><creator>DETERT DOUGLAS</creator><creator>XU LIN</creator><creator>PAPE ERIC A</creator><scope>EVB</scope></search><sort><creationdate>20230718</creationdate><title>CERAMIC COMPONENT WITH CHANNELS</title><author>HAZARIKA PANKAJ ; WETZEL DAVID JOSEPH ; LIU LEI ; KERNS JOHN MICHAEL ; DETERT DOUGLAS ; XU LIN ; PAPE ERIC A</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_CN116457914A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>chi ; eng</language><creationdate>2023</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS</topic><topic>ELECTRICITY</topic><toplevel>online_resources</toplevel><creatorcontrib>HAZARIKA PANKAJ</creatorcontrib><creatorcontrib>WETZEL DAVID JOSEPH</creatorcontrib><creatorcontrib>LIU LEI</creatorcontrib><creatorcontrib>KERNS JOHN MICHAEL</creatorcontrib><creatorcontrib>DETERT DOUGLAS</creatorcontrib><creatorcontrib>XU LIN</creatorcontrib><creatorcontrib>PAPE ERIC A</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>HAZARIKA PANKAJ</au><au>WETZEL DAVID JOSEPH</au><au>LIU LEI</au><au>KERNS JOHN MICHAEL</au><au>DETERT DOUGLAS</au><au>XU LIN</au><au>PAPE ERIC A</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>CERAMIC COMPONENT WITH CHANNELS</title><date>2023-07-18</date><risdate>2023</risdate><abstract>Methods for forming components of a plasma processing chamber are provided. An internal mold is provided. An outer mold surrounding the inner mold is provided. The outer mold is filled with a ceramic powder, wherein the ceramic powder surrounds the inner mold. The ceramic powder is sintered to form a solid component. The solid component is removed from the outer mold.
提供用于形成等离子体处理室的构件的方法。提供内部模具。提供将该内部模具围绕的外部模具。用陶瓷粉末填充该外部模具，其中该陶瓷粉末围绕该内部模具。烧结该陶瓷粉末以形成实心部件。将该实心部件从该外部模具移除。</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRICITY |
| title | CERAMIC COMPONENT WITH CHANNELS |
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