CERAMIC COMPONENT WITH CHANNELS
Methods for forming components of a plasma processing chamber are provided. An internal mold is provided. An outer mold surrounding the inner mold is provided. The outer mold is filled with a ceramic powder, wherein the ceramic powder surrounds the inner mold. The ceramic powder is sintered to form...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | Methods for forming components of a plasma processing chamber are provided. An internal mold is provided. An outer mold surrounding the inner mold is provided. The outer mold is filled with a ceramic powder, wherein the ceramic powder surrounds the inner mold. The ceramic powder is sintered to form a solid component. The solid component is removed from the outer mold.
提供用于形成等离子体处理室的构件的方法。提供内部模具。提供将该内部模具围绕的外部模具。用陶瓷粉末填充该外部模具,其中该陶瓷粉末围绕该内部模具。烧结该陶瓷粉末以形成实心部件。将该实心部件从该外部模具移除。 |
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