CERAMIC COMPONENT WITH CHANNELS

Methods for forming components of a plasma processing chamber are provided. An internal mold is provided. An outer mold surrounding the inner mold is provided. The outer mold is filled with a ceramic powder, wherein the ceramic powder surrounds the inner mold. The ceramic powder is sintered to form...

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Bibliographische Detailangaben
Hauptverfasser: HAZARIKA PANKAJ, WETZEL DAVID JOSEPH, LIU LEI, KERNS JOHN MICHAEL, DETERT DOUGLAS, XU LIN, PAPE ERIC A
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Methods for forming components of a plasma processing chamber are provided. An internal mold is provided. An outer mold surrounding the inner mold is provided. The outer mold is filled with a ceramic powder, wherein the ceramic powder surrounds the inner mold. The ceramic powder is sintered to form a solid component. The solid component is removed from the outer mold. 提供用于形成等离子体处理室的构件的方法。提供内部模具。提供将该内部模具围绕的外部模具。用陶瓷粉末填充该外部模具,其中该陶瓷粉末围绕该内部模具。烧结该陶瓷粉末以形成实心部件。将该实心部件从该外部模具移除。