Semiconductor processing chamber

The invention discloses a semiconductor processing chamber which comprises a processing chamber, air inlet pipes are inserted in the positions, close to the top, of the left side and the right side of the processing chamber, and pipe valves are arranged on the air inlet pipes. When gas inlet pipes on the left side and the right side of a processing chamber introduce process gas into the processing chamber, the process gas can enter an inner cavity of a second lining through a plurality of vent holes, the process gas can be stirred and mixed through rotation of a plurality of stirring blades, after the process gas is uniformly mixed, two electric-hydraulic push rods are started to pull two L-shaped baffles to be far away from each other, and meanwhile, the process gas enters the processing chamber through the gas inlet pipes on the left side and the right side of the processing chamber. The two hydraulic push rods are started to push the base to move upwards, and the outer side wall of the base is attached to