Field programmable gate array (FPGA)-based direct-writing photoetching pattern filling method and device, photoetching machine and medium

The invention discloses a direct-writing photoetching graph filling method and device based on an FPGA (Field Programmable Gate Array), a photoetching machine and a medium, and the direct-writing photoetching graph filling method based on the FPGA comprises the following steps: obtaining exposure gr...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	ZHOU ANMENG, WANG YANYAN, SHAO DEYANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CALCULATING CINEMATOGRAPHY COMPUTING COUNTING ELECTROGRAPHY HOLOGRAPHY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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