Field programmable gate array (FPGA)-based direct-writing photoetching pattern filling method and device, photoetching machine and medium

The invention discloses a direct-writing photoetching graph filling method and device based on an FPGA (Field Programmable Gate Array), a photoetching machine and a medium, and the direct-writing photoetching graph filling method based on the FPGA comprises the following steps: obtaining exposure graph region data and graph data; the exposure pattern area is divided into N processing channels according to the exposure pattern area data, area data of the N processing channels are obtained, and N is larger than or equal to 2; according to the area data and the graph data of the N processing channels, performing screening and cutting processing on the graph in the exposure graph area; and filling the graphs in the N processing channels at the same time. According to the FPGA-based direct-writing photoetching pattern filling method provided by the embodiment of the invention, the plurality of processing channels are arranged, and the plurality of processing channels can receive and process the filling of the patt