Coating treatment apparatus, coating treatment method, and storage medium

The invention provides a coating processing apparatus, a coating processing method, and a storage medium capable of detecting defects of coating processing with high precision. A coating processing apparatus according to one embodiment of the present invention includes a support, a substrate holder, a line sensor, and a light source. The support has a plurality of release heads capable of releasing the functional liquid to the substrate. The substrate holder is capable of holding the substrate and moving the substrate relative to the support. The line sensor can shoot the substrate, and the width of the line sensor is larger than that of the substrate. The light source has a long shape and can irradiate light to an imaging region of the line sensor. The angle formed by the optical axis of the line sensor and the front face of the substrate is smaller than the angle formed by the optical axis of the light source and the front face of the substrate. 本发明提供能够高精度地检测涂敷处理的不良的涂敷处理装置、涂敷处理方法和存储介质。本发明的一个方式的涂敷处理装置包括支承件、基