Chamber of chemical vapor deposition equipment

The invention discloses a chamber of a chemical vapor deposition device. The chamber comprises a tray arranged in the chamber and used for carrying a substrate, an upper chamber cover arranged above the tray, a lower chamber cover arranged below the tray and an intermediate base ring serving as a connecting part between the upper chamber cover and the lower chamber cover. The middle base ring comprises a first flange, a second flange and an annular part which are oppositely arranged in the longitudinal direction, the upper cavity cover is away from the tray and hunches up in the transverse direction and the longitudinal direction, and the length of the upper cavity cover in the longitudinal direction is larger than that of the upper cavity cover in the transverse direction. The device has the advantages that the device is convenient to mount and dismount, the mounting and maintenance cost is reduced, a large amount of disordered turbulent flow generated when airflow flows into an arched reaction area is reduc