Method and apparatus for preventing component rupture using stress relief layer

Methods and apparatus for protecting parts of a process chamber from thermal cycling effects of deposited material. In some embodiments, a method of protecting a part of a process chamber includes the steps of: wet etching the part using a weak base or a weak acid; the parts are cleaned through sand...

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Bibliographische Detailangaben
Hauptverfasser: WADA YUICHI, ZHANG GUOXIANG, CHUANG ZI MING C, XU SHAOJIE, CHEN GUOWEI, LEE CHRISTOPHER NAM, WANG XINXIN, ZHONG YAOYING
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Methods and apparatus for protecting parts of a process chamber from thermal cycling effects of deposited material. In some embodiments, a method of protecting a part of a process chamber includes the steps of: wet etching the part using a weak base or a weak acid; the parts are cleaned through sand blasting; at least a portion of the surface of the part is coated with a stress relief layer. The stress relief layer forms a continuous layer of about 50 microns to about 250 microns thick and is configured to maintain structural integrity of the part from thermal cycling of aluminum deposited on the part. The method also includes wet cleaning the part with heated deionized water rinse after forming the stress relief layer. 用于保护工艺腔室的零件免于沉积材料的热循环效应的方法和设备。在一些实施例中,保护工艺腔室的零件的方法包括以下步骤:使用弱碱或弱酸来湿法蚀刻零件;通过喷砂来清洁零件;使用应力释放层来涂覆零件的表面的至少一部分。应力释放层形成大约50微米至大约250微米厚的连续层并且被配置成从在零件上沉积的铝的热循环中保持零件的结构完整性。所述方法也包括在形成应力释放层之后使用经加热的去离子水冲洗来湿法清洁零件。