APPARATUS FOR PROCESSING SUBSTRATE

Exemplary embodiments of the present invention provide an apparatus for processing a substrate. The apparatus for processing a substrate includes: a process chamber having a processing space therein; a support unit for supporting the substrate in the processing space; a gas supply unit for supplying...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: CHOI YOON-SUK, LEE SANG-JEONG, KIM SANG-WOO, LEE HO-JUN, JEONG SEON-WOOK
Format: Patent
Sprache:chi ; eng
Schlagworte:
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