Probe station alignment height measurement method based on monocular distance measurement

The invention relates to a probe station alignment height measuring method based on monocular distance measurement, which comprises the following steps: S1, accurately positioning a wafer on a slide holder to enable a crystal grain of the wafer to be positioned near a gathering position of a fixed focus camera; s2, the slide holder is lifted, the object distance is changed, a plurality of wafer images are shot, and the clearest wafer image is found through a square gradient function to serve as a gathered image; s3, keeping the slide holder at the height of the gathered image, slightly changing the image distance of the fixed-focus camera, and shooting at least two defocused images with different degrees; s4, on the basis of the parameters of the two defocused images, through a point spread function of Gaussian distribution, calculating to obtain an object distance u of the gathered image; and S5, obtaining the height of the probe based on the object distance u of the gathered image and the height difference