Trichlorosilane synthetic furnace heating method and system

The invention discloses a method for heating a trichlorosilane synthetic furnace, and belongs to the technical field of trichlorosilane synthesis in polycrystalline silicon production, the trichlorosilane synthetic furnace is heated by adopting heated chlorosilane or mixed gas of hydrogen and chlorosilane, a discharge port at the top of the trichlorosilane synthetic furnace is connected with a gas recovery subsystem at the rear end, and the trichlorosilane synthetic furnace is connected with a gas recovery subsystem at the rear end. The invention relates to a trichlorosilane synthesis furnace heating system, and solves the problem that a large amount of nitrogen and hydrogen chloride are wasted in a process of heating a trichlorosilane synthesis furnace by using nitrogen in the prior art, or the problem that the production efficiency is influenced due to slow heating in the process of heating the trichlorosilane synthesis furnace by using heated hydrogen, and meanwhile, the invention provides a heating system