Method for in-situ preparation of quantum dot doped polymer film material by spin-coating process
The invention discloses a method for in-situ preparation of a quantum dot doped polymer thin film material by a spin-coating process, which comprises the following steps: firstly, blending a quantum dot precursor and a polymer in a volatile solvent in a molecular scale, and spin-coating the mixed so...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a method for in-situ preparation of a quantum dot doped polymer thin film material by a spin-coating process, which comprises the following steps: firstly, blending a quantum dot precursor and a polymer in a volatile solvent in a molecular scale, and spin-coating the mixed solution on a carrier to form a film. According to the method, the quantum dot doped polymer thin film material can be simply, conveniently and quickly prepared, and a new idea is provided for application of the material in the fields of quantum dot displays, solar collectors, LED light conversion layers and the like.
本发明公开了一种旋涂工艺原位制备量子点掺杂聚合物薄膜材料的方法,在该方法中首先将量子点前驱物与聚合物在易挥发溶剂中进行分子尺度的共混,将该混合溶液在载体上进行旋涂成膜。该方法可以简便快捷的制备量子点掺杂聚合物薄膜材料,为该材料在量子点显示器、太阳能收集器以及LED光转换层等领域的应用提供新思路。 |
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