Black quartz glass and method for producing same

The present invention pertains to: a black quartz glass which contains 0.5-10 mass% of Si and 0.1-5 mass% of SiO, with the remainder being SiO2, has an SCE reflectance of 10% or less at a wavelength of 350-750 nm, and has a refractive index of 10% or less at a wavelength of 350-750 nm; a method for...

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Hauptverfasser: KUNIYOSHI MINORU, SAKURAI MANABU
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The present invention pertains to: a black quartz glass which contains 0.5-10 mass% of Si and 0.1-5 mass% of SiO, with the remainder being SiO2, has an SCE reflectance of 10% or less at a wavelength of 350-750 nm, and has a refractive index of 10% or less at a wavelength of 350-750 nm; a method for producing the black quartz glass; and a product comprising a black quartz glass member using the black quartz glass. The manufacturing method comprises the following steps: (1) fumed silica, (2) a mixed powder of fumed silica and synthetic silica powder, or (3) a mixed powder of fumed silica, synthetic silica powder and spherical silica; a powder obtained by mixing and compacting 0.5-10% by mass of an Si powder and 0.1-5% by mass of an SiO powder is press-molded, and the press-molded product is heated in the atmosphere to sinter fumed silica. Provided are: a black quartz glass which has excellent light-blocking properties, does not cause contamination in a use step, has sufficient color uniformity even if the size