Gas management assembly for high-pressure heat treatment device

The present invention relates to a gas management assembly for a high-pressure heat treatment apparatus, comprising: a housing provided with an internal space; a gas supply module which is provided in the internal space and supplies gas to the internal chamber and the external chamber of the high-pr...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
1. Verfasser: LIN GENRONG
Format: Patent
Sprache:chi ; eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:The present invention relates to a gas management assembly for a high-pressure heat treatment apparatus, comprising: a housing provided with an internal space; a gas supply module which is provided in the internal space and supplies gas to the internal chamber and the external chamber of the high-pressure heat treatment apparatus; an exhaust module which is provided in the internal space and which exhausts the heat-treated object in the internal chamber; a detection module which is connected to the exhaust module in the internal space and detects residual gas remaining in the internal chamber; and a control module for controlling at least one of the gas supply module and the gas exhaust module on the basis of the detection result of the residual gas detected by the detection module. 本发明涉及一种高压热处理装置用的气体管理组件,其包括:壳体,设置有内部空间;供气模块,设置于上述内部空间,用于高压热处理装置的内部腔室和外部腔室供应气体;排气模块,设置于上述内部空间,在上述内部腔室对热处理对象物进行排气;检测模块,在上述内部空间与上述排气模块相连接,用于检测残留在上述内部腔室的残留气体;以及控制模块,以上述检测模块检测出上述残留气体的检测结果为基础,控制上述供气模块以及排气模块中的至少一个。