Base, manufacturing method of base and plasma processing equipment

The invention discloses a base, a manufacturing method of the base and plasma processing equipment, and the base comprises a base disc which is provided with a substrate placing surface for placing a to-be-processed substrate; the heating assembly is positioned in the base disc and is used for heating a substrate to be treated; the cooling assembly is positioned in the base disc, is positioned below the heating assembly and is used for cooling the substrate to be treated; the base shaft is located in the center of the base disc and used for supporting the base disc; and the base disc and the base shaft are integrally cast and formed by the first metal. According to the invention, the heating uniformity of the substrate is improved. 本发明公开了一种基座、基座的制造方法及等离子体处理设备，所述基座包括：基座圆盘，其上设有用于放置待处理基片的基片放置面；加热组件，位于基座圆盘内部，用于加热待处理的所基片；冷却组件，位于基座圆盘内部且位于加热组件下方，用于冷却待处理的基片；基座轴，位于基座圆盘中心，用于支撑基座圆盘；基座圆盘和基座轴由第一金属一体铸造成型，本发明提高了对基片加热的均匀性。