Integrated plasma ion source capable of synchronously desorbing and ionizing

The invention discloses an integrated plasma ion source for synchronous desorption and ionization, and relates to the field of ion sources. The integrated plasma ion source for synchronous desorption and ionization comprises a hollow ceramic cylinder, a cathode and an anode, the anode is fixedly ins...

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Bibliographische Detailangaben
Hauptverfasser: GOMEZ GERARDO, GARY. SCHIFFER, RHEE STEVEN, SHIRLEY JACOB, PU YINGLEI
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses an integrated plasma ion source for synchronous desorption and ionization, and relates to the field of ion sources. The integrated plasma ion source for synchronous desorption and ionization comprises a hollow ceramic cylinder, a cathode and an anode, the anode is fixedly installed on the inner bottom wall of the hollow ceramic cylinder, a ceramic body outlet is formed in the bottom end of the hollow ceramic cylinder, a sealing assembly is assembled between the top of the hollow ceramic cylinder and the cathode, and the sealing assembly is connected with the cathode. The cathode and the anode are provided with circuit components; a gas opening is formed in the outer surface of the hollow ceramic cylinder, and the gas opening is connected with a helium bottle through a gas pipe; and a sample table is arranged below the hollow ceramic cylinder. According to the integrated plasma ion source capable of synchronously desorbing and ionizing, sample pretreatment is not needed in mass spectrom