Data characterization system for boron expansion process of silicon wafer
The invention aims to disclose a silicon wafer boron diffusion process data characterization system. The system comprises a boron diffusion process data module and a sheet resistance data module, and the data collected by the boron diffusion process data module and the data collected by the sheet re...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention aims to disclose a silicon wafer boron diffusion process data characterization system. The system comprises a boron diffusion process data module and a sheet resistance data module, and the data collected by the boron diffusion process data module and the data collected by the sheet resistance data module are matched through a timestamp, a boron diffusion equipment ID, a furnace tube ID and a graphite boat ID. The data collected by the boron diffusion process data module and the data collected by the sheet resistance data module are accurately matched, on one hand, the data collected by each sheet resistance data module can accurately correspond to the data collected by the boron diffusion process data module, and the adaptability of the data collected by the boron diffusion process data module is accurately reflected; the boron diffusion process can be conveniently and timely adjusted; and on the other hand, big data processing on the data acquired by the boron diffusion process data module and |
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