Antistatic fabric, fabric processing device and fabric processing method

The invention discloses an antistatic fabric, a fabric processing device and a fabric processing method. The antistatic fabric comprises a fabric base layer and an antistatic layer, the antistatic layer is arranged on the surface of the fabric base layer, grooves with preset paths are formed in the...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: WU ZHEN, WEN TAO, ZHENG ENDE
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention discloses an antistatic fabric, a fabric processing device and a fabric processing method. The antistatic fabric comprises a fabric base layer and an antistatic layer, the antistatic layer is arranged on the surface of the fabric base layer, grooves with preset paths are formed in the antistatic layer, conductive fibers are arranged in the grooves, and microspheres are arranged in the grooves; the antistatic agent is arranged inside the microspheres, the microspheres can be subjected to micro-explosion, the antistatic agent inside the microspheres is released in the micro-explosion process of the microspheres, the antistatic agent is mixed with the conductive fibers, the grooves are filled with the antistatic agent, the photoinitiator is added into the antistatic agent, and ultraviolet light induces the photoinitiator to generate free radicals and initiate polymerization reaction, so that the friction voltage of the fabric is reduced, and the antistatic effect is improved. 本发明公开的一种抗静电面料、面料加工装置及面