Plasma-based graphitization process method

The invention discloses a graphitization process method based on plasma, and relates to the technical field of material graphitization, and the graphitization process method comprises the following steps: S1, crucible pretreatment: putting a crucible in a vacuum environment, and carrying out impurity removal treatment by using high-temperature plasma of a generator; after the treatment is completed, cooling the crucible to normal temperature and taking out; s2, a graphite material is placed, specifically, the graphite material is placed in the crucible treated in the step S1, and the crucible is placed in a vacuum container and located under a generator; s3, vacuumizing, wherein after the vacuum container is sealed, a vacuum pump is used for extracting the vacuum container; s4, performing high-temperature graphitization: filling inert gas into a generator, sequentially starting the generator and an accelerating magnetic field, enabling the temperature of a temperature field to be higher than 3000 DEG C within