Cleaning system for photovoltaic silicon wafer
The photovoltaic silicon wafer cleaning system comprises a cleaning mechanism, a drying mechanism and a transfer mechanism located between the cleaning mechanism and the drying mechanism, the cleaning mechanism comprises a feeding conveying line, a conveying device, a discharging conveying line and...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The photovoltaic silicon wafer cleaning system comprises a cleaning mechanism, a drying mechanism and a transfer mechanism located between the cleaning mechanism and the drying mechanism, the cleaning mechanism comprises a feeding conveying line, a conveying device, a discharging conveying line and a plurality of cleaning grooves, and the cleaning grooves are located between the feeding conveying line and the discharging conveying line. The conveying device comprises at least one mechanical arm capable of moving along the cross, the mechanical arms correspond to the feeding conveying line and are located above the cleaning tank, and each mechanical arm can directly clamp one graphite boat. Each cleaning tank comprises a tank body with an opening in the upper end, a cleaning cavity is defined by the tank body, each cleaning tank comprises at least one turning plate device, and the turning plate devices can divide the cleaning cavities so that the graphite boats can be placed in the cleaning cavities at interva |
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