Hundred thousand electron volt electron micron external beam generation device and generation method

The invention discloses a hundred-thousand-electron-volt electron micron external beam generation device and method, and relates to the technical field of electron micron external beam generation, a double plasma ion source generates an ion beam, the beam passes through a Faraday cup after being accelerated by a four-stage lens, passes through a gate valve and then is accelerated by an RFQ acceleration cavity and a DB-DTL acceleration cavity, and the DB-DTL acceleration cavity is formed. The beam enters a target chamber after being focused by a four-stage lens and a deflection field, namely a counter bore of the table top of the second workbench, a Faraday cup is used for monitoring the beam intensity, and a 560keV or 2.5 MeV beam enters the target chamber and then passes through a conical capillary tube to obtain a micron outer beam, so that a basis is provided for performing various experiments, and the experiment efficiency is improved. A 560keV or 2.5 MeV beam enters the target chamber and then passes thr