Failure analysis method and device of semiconductor structure and electronic equipment

The invention provides a failure analysis method of a semiconductor structure, which is applied to the technical field of semiconductors. Specifically, aiming at the problem of failure of a certain film of a semiconductor sample with a film structure made of a low-k medium, the conventional photogra...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	NIU SHUFAN, ZOU YA, GAO JINDE, DUAN SHUQING
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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