SUBSTRATE PROCESSING APPARATUS, CONTROL DEVICE FOR SUBSTRATE PROCESSING APPARATUS, CONTROL METHOD FOR SUBSTRATE PROCESSING APPARATUS, AND STORAGE MEDIUM STORAGE PROGRAM

The invention provides a substrate processing apparatus, a control apparatus of the substrate processing apparatus, a control method of the substrate processing apparatus, and a storage medium storing a program. The present invention addresses the problem of flexibly and quickly saving a processing...

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Bibliographische Detailangaben
1. Verfasser:	KAGAYA SHUNSUKE
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS THEREFOR BASIC ELECTRIC ELEMENTS CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS CHEMISTRY CONVEYING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROFORMING ELECTROLYTIC OR ELECTROPHORETIC PROCESSES HANDLING THIN OR FILAMENTARY MATERIAL MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS METALLURGY PACKING PERFORMING OPERATIONS PNEUMATIC TUBE CONVEYORS PRINTED CIRCUITS PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTIONOF COATINGS SEMICONDUCTOR DEVICES SHOP CONVEYOR SYSTEMS STORING TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING ORTIPPING TRANSPORTING
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Beschreibung
Zusammenfassung:	The invention provides a substrate processing apparatus, a control apparatus of the substrate processing apparatus, a control method of the substrate processing apparatus, and a storage medium storing a program. The present invention addresses the problem of flexibly and quickly saving a processing liquid in a substrate processing apparatus. A substrate processing apparatus is configured so as to switch a transfer schedule between a normal mode in which productivity of the substrate processing apparatus is maximized and a processing liquid saving mode in which a processing liquid is saved in at least one processing tank, and is configured so as to adjust the processing speed of the entire substrate processing apparatus on the basis of a speed limiting unit that limits the processing speed of the entire substrate processing apparatus. And a control unit that determines whether or not there is an idle period in which a required production amount in the substrate processing apparatus is small, sets the transfer