Chemical mechanical planarization (CMP) post-cleaning

The present invention provides a cleaning composition comprising water; one or more organic acids; at least two surfactants wherein the first type of surfactant is a diphenyldisulfonic acid surfactant, the second type of surfactant has a surface tension of less than 50 dynes/cm at a concentration of...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TAMBOLI DHEERAJ, YOO JEONG-YOON, HWANG HEE-MIN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES CANDLES CHEMISTRY DETERGENT COMPOSITIONS DETERGENTS FATTY ACIDS THEREFROM METALLURGY RECOVERY OF GLYCEROL RESIN SOAPS SOAP OR SOAP-MAKING USE OF SINGLE SUBSTANCES AS DETERGENTS
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!