Method and device for improving titanium-aluminum corrosion morphology through double-layer mask

The invention provides a method and device for improving titanium-aluminum corrosion morphology through double-layer masks, and the method comprises the steps: sequentially depositing a metal titanium layer and a metal aluminum layer on the surface of a wafer, and growing an oxidation film with a preset thickness on the metal aluminum layer; spin-coating photoresist on the surface of the oxide film corresponding to the to-be-corroded areas of the metal titanium layer and the metal aluminum layer, and carrying out photoetching treatment on the photoresist to form a photoresist film with a window in a preset shape; etching the oxide film through the photoresist film with the window in the preset shape to form an oxide film with the window in the preset shape; the metal aluminum layer and the metal titanium layer are sequentially corroded through the oxidation film with the window in the preset shape and the photoresist film, the metal titanium layer with the window in the preset shape and the metal aluminum lay