Semiconductor pattern forming method and refrigeration infrared detector manufacturing method

The invention provides a forming method of a semiconductor pattern and a manufacturing method of a refrigeration infrared detector, and the forming method comprises the steps: providing a substrate which is covered with a stripping material layer; forming a photoresist material layer to cover the stripping material layer, performing first pre-baking on the photoresist material layer, and performing second pre-baking after cooling for a preset time; an exposure process and a development process are executed, a part of the photoresist material layer and the stripping material layer are removed to form a photoresist pattern and a stripping pattern, and the stripping pattern is shrunk inwards along the surface of the substrate relative to the photoresist pattern to form a lateral groove; a coating process is executed, a semiconductor film is formed to cover the surface of the substrate and the outer wall of the photoresist pattern, and the remaining lateral groove serves as a stripping window; and executing a str