Atomic layer deposition method

The invention discloses an atomic layer deposition method, which comprises the following steps of: providing ionized fluorine ions in a reaction cavity; introducing silane, nitric oxide and inert gas into the reaction cavity; applying a radio frequency sputtering method in the reaction cavity to gen...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LIANG HEMING, MAO PENGFEI, CHEN YAQI, MEI SHENGLI, WU JIE, WANG TIESHUANG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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