COMPOSITION FOR FORMING PROTECTIVE FILM, PROTECTIVE FILM, METHOD FOR FORMING PROTECTIVE FILM, AND METHOD FOR MANUFACTURING SUBSTRATE

The invention provides a composition for forming a protective film, a protective film, a method for forming the protective film, and a method for manufacturing a patterned substrate, wherein the composition has excellent coating property. A composition for forming a protective film for forming a pro...

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Bibliographische Detailangaben
Hauptverfasser:	TAKANASHI KAZUNORI, MIYAUCHI HIROYUKI, IDEI SATOSHI, KAWAZU TOMOHARU, OKUMURA NAO
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMISTRY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The invention provides a composition for forming a protective film, a protective film, a method for forming the protective film, and a method for manufacturing a patterned substrate, wherein the composition has excellent coating property. A composition for forming a protective film for forming a protective film only on the peripheral edge of a substrate, the composition containing a solvent and a compound having an aromatic ring, the solvent including a first solvent having a normal boiling point of 156 DEG C or more and less than 300 DEG C. 本发明提供一种涂敷性优异的保护膜形成用组合物、保护膜、保护膜的形成方法、及经图案化的基板的制造方法。一种保护膜形成用组合物，用于仅在基板的周缘部形成保护膜，所述保护膜形成用组合物含有具有芳香环的化合物与溶媒，所述溶媒包含标准沸点为156℃以上且未满300℃的第一溶媒。