Semiconductor device diagnostic apparatus and method

The present invention provides a semiconductor device diagnosis apparatus and method for analyzing a determination result of a substrate and a cause of a defect by using a deep learning algorithm and interpretable artificial intelligence. The semiconductor device diagnosis method includes: a step of acquiring time series data of a parameter related to a substrate processing process of a substrate processing apparatus; generating table information on the basis of the time series data; a step of converting the table information into image information on the basis of the data included in the table information; extracting indexes from the image information and classifying the indexes; a step of determining whether the substrate processed by the substrate processing apparatus is good or bad based on the index; and analyzing the cause of the substrate defect when it is determined that the substrate is defective. 本发明提供了利用深度学习算法和可解释人工智能来分析对基板的判定结果和不良原因的半导体设备诊断装置及方法。所述半导体设备诊断方法包括：获取与基板处理装置的基板处理工艺相关的参数的时序数据的步骤；基于时序数据生成