KrF light source thick film photoresist composition and preparation method thereof

The invention discloses a KrF light source thick film photoresist composition and a preparation method thereof. Specifically, the invention discloses a KrF thick film photoresist composition containing a photoacid generator as shown in a formula I. A photoresist film formed by the photoresist compos...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	FANG SHUNONG, CUI ZHONGYUE, GENG ZHIYUE, WANG SU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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