KrF light source thick film photoresist composition and preparation method thereof

The invention discloses a KrF light source thick film photoresist composition and a preparation method thereof. Specifically, the invention discloses a KrF thick film photoresist composition containing a photoacid generator as shown in a formula I. A photoresist film formed by the photoresist compos...

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Bibliographische Detailangaben
Hauptverfasser:	FANG SHUNONG, CUI ZHONGYUE, GENG ZHIYUE, WANG SU
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	The invention discloses a KrF light source thick film photoresist composition and a preparation method thereof. Specifically, the invention discloses a KrF thick film photoresist composition containing a photoacid generator as shown in a formula I. A photoresist film formed by the photoresist composition is good in rectangularity. 本发明公开了一种KrF光源厚膜光刻胶组合物及其制备方法。具体地，本发明公开了一种包含如式Ⅰ所示的光产酸剂的KrF厚膜光刻胶组合物，由该光刻胶组合物形成的光刻胶胶膜矩形性佳。