Substrate processing apparatus

The present invention relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus for performing substrate processing on a plurality of substrates in a process chamber in which a plurality of processing spaces are formed. The present invention discloses a substrate processing apparatus, comprising: a process chamber forming N processing spaces which are mutually distinguished to process a substrate; n gas injection units that inject gas into the processing space; the N substrate supporting parts are used for supporting the substrate; a transfer support part that supports the substrate as a transfer target to transfer the substrate; a rotation support unit on which the substrates are placed so as to rotate the substrates about a second rotation axis in the vertical direction passing through the substrates; and the rotating power module is used for providing rotating power for the conveying supporting part and the rotating supporting part respectively. 本发明涉及基板处理装置，更详细