Secondary imaging layout splitting method and system and storage medium

The invention relates to the technical field of photoetching machines, in particular to a secondary imaging layout splitting method and system and a storage medium, and the method comprises the following steps: obtaining an original layout which has a plurality of graphs, each graph comprises a plur...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	WANG HUANMING, DING MING, RUAN WENSHENG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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