Secondary imaging layout splitting method and system and storage medium

The invention relates to the technical field of photoetching machines, in particular to a secondary imaging layout splitting method and system and a storage medium, and the method comprises the following steps: obtaining an original layout which has a plurality of graphs, each graph comprises a plurality of instances, and the distance between the instances is greater than or equal to a first preset distance; taking one instance in each type of unit in the graph as a representative instance, splitting the representative instance of each type of unit to obtain a preset threshold number of layouts, and placing the layouts obtained by splitting the representative instance at all instances of the same unit; calculating a flipping coefficient between the two, and flipping the instance in the graph based on a first preset rule; according to the method, all the overturning coefficients in the graph are summed to obtain the sum of the overturning coefficients, whether the overturning coefficients meet the preset thres