Rapid annealing equipment for semiconductor wafer and use method of rapid annealing equipment

The invention discloses rapid annealing equipment for a semiconductor wafer and a using method of the rapid annealing equipment, and belongs to the technical field of semiconductor wafer manufacturing and processing.The rapid annealing equipment comprises an annealing furnace unit, a furnace core bo...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	SHEN FULONG, QIAN YONG
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!