Processing chamber, substrate processing method and processing device

The invention discloses a processing chamber, a substrate processing method and a substrate processing device. The processing chamber comprises a chamber body assembly and a chamber door assembly. The cavity assembly comprises a cavity; the cavity door assembly comprises a spraying plate and a cavit...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	LI WEIMING, KANG XU, SHI SHUPENG, YAN DA, SHEN ANLEI
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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