Processing chamber, substrate processing method and processing device

The invention discloses a processing chamber, a substrate processing method and a substrate processing device. The processing chamber comprises a chamber body assembly and a chamber door assembly. The cavity assembly comprises a cavity; the cavity door assembly comprises a spraying plate and a cavity door, the spraying plate is arranged on the cavity door, when the cavity door assembly is closed, the spraying plate covers one end of the cavity, a treatment space is defined by the cavity and the spraying plate, and the spraying plate can introduce treatment gas into the treatment space. According to the processing chamber provided by the invention, the spraying plate covers the chamber body, so that the processing chamber and the internal structure thereof are simplified, and the internal space of the chamber body is increased under the condition that the processing chamber occupies the same use space, so that the chamber body can accommodate larger and more substrates, the processing capacity is improved, and