SUBSTRATE PROCESSING APPARATUS, TEMPERATURE CONTROL PROGRAM, SEMICONDUCTOR DEVICE MANUFACTURING METHOD, AND TEMPERATURE CONTROL METHOD

The present invention is configured so as to have a cooling control unit that acquires information on the temperature of a heating unit and/or the temperature of a processing chamber, the degree of opening of a cooling valve, and an exhaust fan; the opening degree of the cooling valve is adjusted su...

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Bibliographische Detailangaben
Hauptverfasser: SUGISHITA MASASHI, YAMAGUCHI HIDETO, KOSUGI TETSUYA, SHIGEMATSU SEIYA, UENO MASAAKI, MAEDA SHUHEI
Format: Patent
Sprache:chi ; eng
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