Repair method of nanoimprint master mold
The invention discloses a method for repairing a nanoimprint master mold, the nanoimprint master mold is made of template glue, and the nanoimprint master mold is attached with sub-film glue to be cleaned and removed; the template glue is organic silicon resin, and the sub-mold glue is polyester res...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The invention discloses a method for repairing a nanoimprint master mold, the nanoimprint master mold is made of template glue, and the nanoimprint master mold is attached with sub-film glue to be cleaned and removed; the template glue is organic silicon resin, and the sub-mold glue is polyester resin; the method comprises the following steps: uniformly mixing an alkaline cleaning solution with purified water so as to dilute the alkaline cleaning solution; soaking the nanoimprint master mold by using diluted alkaline cleaning liquid to dissolve the sub-mold glue; and cleaning the nanoimprint master mold with purified water to remove the sub-mold glue.
本申请公开了一种纳米压印母模的修复方法,所述纳米压印母模由模板胶制成,所述纳米压印母模附着有待清洗去除的子膜胶;所述模板胶为有机硅树脂,所述子模胶为聚酯树脂;所述方法包括:将碱性清洗液与纯净水混合均匀以对所述碱性清洗液进行稀释处理;使用经过稀释处理的碱性清洗液浸泡所述纳米压印母模以溶解子膜胶;使用纯净水对所述纳米压印母模进行清洗以去除子膜胶。 |
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