Thin film thickness measuring method and device, electronic equipment and storage medium

The invention is suitable for the technical field of thin film manufacturing, and provides a thin film thickness measuring method and device, electronic equipment and a storage medium. The method comprises the following steps: obtaining a first film thickness of a thin film according to theoretical...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: HAN YUYONG, WANG SHUAI, HONG FENG, ZHANG YUFAN, ZHANG XUENA
Format: Patent
Sprache:chi ; eng
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Beschreibung
Zusammenfassung:The invention is suitable for the technical field of thin film manufacturing, and provides a thin film thickness measuring method and device, electronic equipment and a storage medium. The method comprises the following steps: obtaining a first film thickness of a thin film according to theoretical data information and first simulation data information of the thin film; according to the first film thickness, obtaining a second film thickness of the thin film according to the first film thickness and a to-be-fitted proportion value, then obtaining second simulation data information of the thin film according to the second film thickness and an optical constant of the thin film, and finally performing fitting according to the theoretical data information and the second simulation data information to obtain a second film thickness of the thin film. Therefore, when the film thickness of the film is measured, the relevance of the to-be-measured point positions of the film can be fully considered, the film thicknes