Diffusion furnace tube and method for improving sheet resistance uniformity of silicon wafer by adopting diffusion furnace tube

The invention provides a diffusion furnace tube and a method for improving sheet resistance uniformity of a silicon wafer by adopting the diffusion furnace tube, the diffusion furnace tube comprises a furnace body (1) and an air inlet pipe (2), the furnace body comprises an air inlet (3) and an air...

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Bibliographische Detailangaben
Hauptverfasser: REN YONG, SHI ZHAOCHUN, ZHAO YING, QI LINA, HE YUE
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:The invention provides a diffusion furnace tube and a method for improving sheet resistance uniformity of a silicon wafer by adopting the diffusion furnace tube, the diffusion furnace tube comprises a furnace body (1) and an air inlet pipe (2), the furnace body comprises an air inlet (3) and an air outlet (4), the air inlet pipe (2) extends into the furnace body (1) through the air inlet (3), and the air inlet pipe (2) is located at the bottom of the furnace body (1); and at least two air outlets (5) are formed in the air inlet pipe (2) in the furnace body. The at least two air outlet holes are formed in the air inlet pipe, the air inlet uniformity is improved, the amount of phosphorus sources at the top of the quartz boat is obviously increased when the diffusion furnace tube runs, the problem that the amount of phosphorus sources of battery pieces at the top of the quartz boat is low is solved, sintering pollution is avoided, and meanwhile the uniformity of sheet resistance of silicon wafers is effectively