Manufacturing method of microwave probe and microwave probe

The invention provides a microwave probe manufacturing method and a microwave probe. The microwave probe manufacturing method comprises the steps that a first substrate is coated with a first photoresist layer; exposing and developing the first photoresist layer through a mask plate to form a first sample; dry etching is carried out on the first sample, the morphology of the photoresist pattern structure on the first photoresist is etched downwards to the first substrate in an etching mode, and a groove is formed in the surface of the first substrate after photoresist removal; a second substrate is provided, the surface, where the Ti/Au film is deposited, of the first substrate is connected with the surface, where the Ti/Au film is deposited, of the second substrate, and silicon-silicon wafer eutectic bonding is carried out; grinding and polishing the surface, deviating from the groove, of the first substrate after eutectic bonding until the groove is exposed; electroplating is carried out, so that the electr