Photomask container

The invention provides a photomask container which can firmly hold a photomask substrate and suppress condensation of a photomask substrate accommodating part, is excellent in cleanliness, is not easy to adhere dirt (particles) on the surface of the photomask substrate, and is light in weight and excellent in mechanical strength. The photomask container is characterized in that a photomask substrate accommodating part of the photomask container is formed by a container main body and a cover body, and the photomask container is used for storing and transporting a photomask substrate in a state that the photomask substrate is accommodated in the photomask substrate accommodating part. The container main body is a box-shaped body formed from a high-density polyethylene resin having a melt flow rate (MFR) of 0.6 (g/10 minutes) or less, the box-shaped body comprising a substantially flat-plate-shaped base part and a side wall part provided in a substantially right-angled direction from an end part of the base part