Method for supplying chemical solution and method for forming pattern

The present invention addresses the problem of providing a method for supplying a chemical solution with which it is possible to further reduce the content of impurities in the chemical solution. The present invention also addresses the problem of providing a pattern forming method. This method for supplying a chemical solution is a method for supplying a chemical solution containing an organic solvent through the inside of a conduit provided in an apparatus for semiconductor devices, the method comprising: a gas pressure feeding step for feeding the chemical solution by pressurizing using a gas, the amount of water contained in the gas is 0.00001-1 ppm by mass relative to the total mass of the gas. 本发明的课题在于提供一种能够进一步减少药液中的杂质含量的药液的供给方法。并且，本发明的课题还在于提供一种图案形成方法。本发明的药液的供给方法为通过半导体器件用装置所具备的管路内供给含有有机溶剂的药液的药液的供给方法，该药液的供给方法具有：气体压送工序，通过使用气体进行加压而送出上述药液，上述气体中含有的水分量相对于上述气体的总质量为0.00001～1质量ppm。