Azo compound preparation device

Disclosed is an azo compound preparation apparatus. The disclosed apparatus for preparing an azo compound comprises: a reaction unit for holding a first solution containing a hydroazo compound and at least one type of MaXb; a cathode configured to be in direct contact with the hydroazo compound with...

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Bibliographische Detailangaben
Hauptverfasser: KIM YOUNG-KI, CHOI SOK-KYUN, SEEN MIN-SEUNG, SON SOO-MIN
Format: Patent
Sprache:chi ; eng
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Zusammenfassung:Disclosed is an azo compound preparation apparatus. The disclosed apparatus for preparing an azo compound comprises: a reaction unit for holding a first solution containing a hydroazo compound and at least one type of MaXb; a cathode configured to be in direct contact with the hydroazo compound within the reaction unit; and an anode disposed in the reaction unit so as to be in contact with the solution. Wherein X can be a halogen element, M is selected from at least one of hydrogen, Li, Na, K, Mg, Ca, Mn, Fe, Ni, Cu, Ag, Zn, Sn, Zr and Ti, or is selected from at least one of primary ammonium ions, secondary ammonium ions and tertiary ammonium ions, H is hydrogen, and a and b can be independently any integer from 1 to 4. 公开了偶氮化合物制备装置。公开的偶氮化合物制备装置包括:反应单元,其用于盛装含有氢化偶氮化合物以及至少一种MaXb的第一溶液;阴极,其配置成在所述反应单元内与所述氢化偶氮化合物直接接触;以及阳极,其以与所述溶液接触的方式配置在所述反应单元内。其中,所述X可以是卤素元素,所述M是选自氢、Li、Na、K、Mg、Ca、Mn、Fe、Ni、Cu、Ag、Zn、Sn、Zr、Ti中的至少一种,或者,是选自一级铵离子、二级铵离子、三级铵离子中的至少一种,所述H是氢,所述a及所述b可以相互独立地为1至4中任一整数。