Condition number-based nanostructure scattering measurement configuration optimization method and system

The invention discloses a condition number-based nanostructure scattering measurement configuration optimization method and system, and belongs to the technical field of photolithography, and the method comprises the steps: S1, determining to-be-measured morphology parameters of a nanostructure and fixed parameters in a scattering measurement parameter extraction process; s2, constructing an evaluation function for measuring a fitting error between a measurement signal and a theoretical signal in scattering measurement based on the to-be-measured morphology parameters and the fixed parameters; s3, based on the evaluation function, obtaining an error transfer matrix of the to-be-measured morphology parameters; and S4, the condition number of the error transfer matrix of the to-be-measured morphology parameters under different measurement conditions is calculated, and the measurement condition with the minimum condition number is the optimal configuration. The invention also provides a nanostructure scattering