Photoresist underlayer composition and method for forming pattern using same

The present invention relates to a photoresist underlayer composition and a method for forming a pattern using the same, the photoresist underlayer composition comprising a polymer having a ring skeleton containing two or more nitrogen atoms in a ring, a compound represented by Chemical Formula 1, a...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	PARK HYUN, CHEON MIN-KI, SONG DAE-SEOK, GWON SOON-HYUNG, BAEK JAE-YEOL, JIN HWA-YOUNG, CHOI YOO-JEONG, BAE SHIN-HYO, KIM MIN-SOO, KIM SUNG-JIN
Format:	Patent
Sprache:	chi ; eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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